Spacer Engineered FinFET Architectures
High-Performance Digital Circuit Applications
Paperback Engels 2020 1e druk 9780367573553Samenvatting
This book focusses on the spacer engineering aspects of novel MOS-based device–circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.
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