M. Gentili,
Carlo Giovannella,
Stefano Selci
Nanolithography
A Borderland between STM, EB, IB, and X-Ray Lithographies
Gebonden Engels 1994 1994e druk 9780792327943Levertijd ongeveer 9 werkdagen
Gratis verzonden
Samenvatting
Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography.
Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL).
Specificaties
ISBN13:9780792327943
Taal:Engels
Bindwijze:Gebonden
Aantal pagina's:216
Uitgever:Springer Netherlands
Druk:1994
Serie:Nato Science Series E:
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