FinFET Devices for VLSI Circuits and Systems

Gebonden Engels 2020 9781138586093
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Samenvatting

To surmount the continuous scaling challenges of MOSFET devices, FinFETs have emerged as the real alternative for use as the next generation device for IC fabrication technology. The objective of this book is to provide the basic theory and operating principles of FinFET devices and technology, an overview of FinFET device architecture and manufacturing processes, and detailed formulation of FinFET electrostatic and dynamic device characteristics for IC design and manufacturing. Thus, this book caters to practicing engineers transitioning to FinFET technology and prepares the next generation of device engineers and academic experts on mainstream device technology at the nanometer-nodes.

Specificaties

ISBN13:9781138586093
Taal:Engels
Bindwijze:Gebonden
Aantal pagina's:318
Uitgever:Taylor & Francis Ltd

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Inhoudsopgave

Chapter 1 Introduction...........................................................................................1

Chapter 2 Fundamentals of Semiconductor Physics............................................25

Chapter 3 Multiple-Gate Metal-Oxide-Semiconductor (MOS) System..............85

Chapter 4 Overview of FinFET Device Technology......................................... 133

Chapter 5 Large Geometry FinFET Device Operation..................................... 151

Chapter 7 Leakage Currents in FinFETs........................................................... 215

Chapter 8 Parasitic Elements in FinFETs.......................................................... 231

Chapter 9 Challenges to FinFET Process and Device Technology .................. 257

Chapter 10 FinFET Compact Models for Circuit Simulation..............................277

Index.......................................................................................................................309

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          FinFET Devices for VLSI Circuits and Systems