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Plasma Deposited Thin Films

Gebonden Engels 2017 9781315896717
€ 308,13
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In Summary, the objective of this book is to present in one volume a review of the plasma deposition process and the present understanding of the most important and widely used plasma deposited thin film materials, devices and their applications.

Specificaties

ISBN13:9781315896717
Taal:Engels
Bindwijze:Gebonden
Aantal pagina's:253
Uitgever:Taylor & Francis Ltd

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Inhoudsopgave

1. Plasma Deposition Processes 2. Plasma-Deposited Films: Kinetics of Formation, Composition, and Microstructure 3. Electronic Properties of Plasma-Deposited Semiconductor Films 4. Carbon Thin Films 5. Silicon Nitride and Other Insulator Films 6. Photovoltaic Structures by Plasma Deposition 7. Xerographic Applications of Plasma-Deposited Amorphous Tetrahedral Materials 8. Hydrogenated Amorphous Silicon Electronic Devices and Their Arrays

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          Plasma Deposited Thin Films