Sudeb Dasgupta,
Brajesh Kumar Kaushik,
Pankaj Kumar Pal
Spacer Engineered FinFET Architectures
High-Performance Digital Circuit Applications
Gebonden Engels 2017 9781498783590Levertijd ± 8 werkdagen
Gratis verzonden
Samenvatting
This book focusses on the spacer engineering aspects of novel MOS-based device–circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.
Specificaties
ISBN13:9781498783590
Taal:Engels
Bindwijze:Gebonden
Aantal pagina's:154
Uitgever:Taylor & Francis Inc
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Inhoudsopgave
Preface
About the Authors
Chapter 1 ◾ Introduction to Nanoelectronics
Chapter 2 ◾ Tri-Gate FinFET Technology and Its Advancement
Chapter 3 ◾ Dual-k Spacer Device Architecture and Its Electrostatics
Chapter 4 ◾ Capacitive Analysis and Dual-k FinFET-Based Digital Circuit Design
Chapter 5 ◾ Design Metric Improvement of a Dual-k–Based SRAM Cell
Chapter 6 ◾ Statistical Variability and Sensitivity Analysis
INDEX
About the Authors
Chapter 1 ◾ Introduction to Nanoelectronics
Chapter 2 ◾ Tri-Gate FinFET Technology and Its Advancement
Chapter 3 ◾ Dual-k Spacer Device Architecture and Its Electrostatics
Chapter 4 ◾ Capacitive Analysis and Dual-k FinFET-Based Digital Circuit Design
Chapter 5 ◾ Design Metric Improvement of a Dual-k–Based SRAM Cell
Chapter 6 ◾ Statistical Variability and Sensitivity Analysis
INDEX
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