Alexander A. Demkov,
Willy Rachmady,
Jeffery W. Butterbaugh,
H. Rusty Harris,
Bill Taylor
e.a.
CMOS Gate-Stack Scaling - Materials, Interfaces and Reliability Implications
Gebonden EN 2009 9781605111285Levertijd ongeveer 16 werkdagen
Gratis verzonden
Samenvatting
To address the increasing demands of device scaling, new materials are being introduced into conventional Si CMOS processing at an unprecedented rate. Presentations collected here focus on understanding, from a chemistry and materials perspective, the mechanism of interface formation and defects at interfaces, for both conventional Si and alternative channel (Ge or III-V) systems. Several papers address reliability concerns for high-k/metal gate (basic physical models, charge trapping, etc.), while others cover characterization of the thin films and interfaces which comprise the gate stack. Topics include: advanced Si-based gate stacks; and alternate channel materials.
Specificaties
ISBN13:9781605111285
Taal:EN
Bindwijze:Gebonden
Aantal pagina's:194
Uitgever:Materials Research Society
Serie:MRS Proceedings
Lezersrecensies
Wees de eerste die een lezersrecensie schrijft!
Rubrieken
- advisering
- algemeen management
- coaching en trainen
- communicatie en media
- economie
- financieel management
- inkoop en logistiek
- internet en social media
- it-management / ict
- juridisch
- leiderschap
- marketing
- mens en maatschappij
- non-profit
- ondernemen
- organisatiekunde
- personal finance
- personeelsmanagement
- persoonlijke effectiviteit
- projectmanagement
- psychologie
- reclame en verkoop
- strategisch management
- verandermanagement
- werk en loopbaan