Bei Yu,
David Z. Pan
Design for Manufacturability with Advanced Lithography
Gebonden Engels 2015 9783319203843Levertijd ongeveer 9 werkdagen
Gratis verzonden
Samenvatting
This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.
Specificaties
ISBN13:9783319203843
Taal:Engels
Bindwijze:gebonden
Uitgever:Springer International Publishing
Lezersrecensies
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Inhoudsopgave
<p>Introduction.- Layout Decomposition for Triple Patterning.- Layout Decomposition for Other Patterning Techniques.- Standard Cell Compliance and Placement Co-Optimization.- Design for Manufacturability with E-Beam Lithography.- Conclusions and Future Works.-</p>
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